New Facing Targets Sputtering System
Overview | Features | Principle | Applications | Product Information
Product Information
Product Information | Box-shaped Source | Rotary Substrate | Stationary Substrate | In-line Substrate | Web-coater
Stationary substrate type NFTS
Stationary substrate type NFTS
Tandem type plasma sources
Stationary substrate type NFTS equipment is widely used from basic research to mass production processes. This type of equipment makes it possible to prepare an equally thin film thickness on a stationary 12inches sized wafer by using tandem type NFTS plasma sources. This type easily changes the distance between a substrate and plasma source and substrate temperature using a substrate heater mechanism. Thus this type is useful to produce thin films that have a crystalline structure in comparison with any conventional technology under relatively lower temperature.