New Facing Targets Sputtering System
Overview | Features | Principle | Applications | Product Information
Product Information
Product Information | Box-shaped Source | Rotary Substrate | Stationary Substrate | In-line Substrate | Web-coater
Rotary Substrate type NFTS
Rotary substrate type equipment is suitable for basic research. This type of equipment can be attached to several small type NFTS plasma sources on a sidewall of the vacuum chamber. Moreover this type can be equipped with several substrate holders in the vacuum chamber. These substrate holders move in front of a plasma source. Thus, this model is able to prepare several samples at a vacuum process and multilayer samples at in situ process using different plasma sources that have different target materials.