•  Synchrotron Beamlines
  •  >Front End Components
    •  >High Heat Load
      •  Graphite Filter
      •  Mask and Absorber
      •  XY Slit
    •  >Standard
      •  Alignment Filter
      •  Graphite Filter
      •  Penetration Pipe
      •  Screen Monitor
  •  >Beamline Components
    •  >Slits
      •  2 Jaw Slits
      •  4 Jaw Slits
    •  >Mirrors
      •  Mirror Bender FMP1000-A
      •  Mirror Bender Systems
      •  Mirror Chambers
    •  Monitors
    •  Filter
  •  >Monochromators
    •  >Hard X-Ray
      •  DCM
      •  Compact DCM
      •  Channel Cut
    •  >Soft X-Ray
      •  VLSPGM
      •  SGM
      •  NIM
  •  >End Stations
    •  Ellipsometers
    •  >Reflectometers
      •  Hard X-ray
      •  Soft X-ray
    •  >Diffractometers
      •  RASOR
      •  SPring-8 Diffractometer
      •  TACoDE
    •  X-ray Lithography
    •  Multilayer Polarimeter
  •  >Complete Beamlines
    •  >BOREAS BL29 at ALBA
      •  Overview
      •  Monochromator
      •  Mirror Chamber
      •  Entrance and Exit slits
      •  2WS and 4WS slits
    •  NewSUBARU
    •  SPring-8 BL17SU
    •  HISOR
    •  UVSOR
    •  Hard X-Ray
•  XFEL Components
  •  >Monochromators
    • XFEL DCM
  •  >Mirror systems
    •  XFEL Mirrors
  •  >Beam Monitors
    •  Current Monitor
    •  RF Beam Position Monitor
    •  Beam Profile Monitor
    •  Energy Slits
  •  >Complete Beamlines
    •  SACLA BL-3
•  Analytical Instruments
  •  >Surface analysis
    •  KNTOF-1800
    •  FIB-TOF-SIMS
  •  >Environmental analysis
    •  Jet-REMPI
    •  LICA-MS
    •  RTM-MS
    •  Outgas analyzer
  •  >STXM
    •  STXM
  •  >Electron time-of-flight
    •  eTOF
•  Accelerator Components
  •  >Beam Monitors
    •  J-PARC Linac
    •  J-PARC Beam Transport
  •  >Ion Sources
    •  H Scource
  •  >RF Quadrupole
    •  RFQ
  •  >Septum Magnets
    •  J-PARC Injection
    •  J-PARC Extraction Low Magnetic Field
    •  J-PARC Extraction Middle Magnetic Field
•  Thin Film Deposition
  •  >Ion Beam Systems
    •  Ion Beam Sputtering
  •  >RF Magnetron Sputtering
    •  RF Magnetron
  •  >NFTS
    •  NFTS
•  Semiconductor Technology
  •  >Surface Analysis tools
    •  Surface Analysis tools
  •  >EUV Optical system
    •  EUV Optical system
  •  >Probing Systems
•  Vacuum Chambers
  •  >Permalloy Chambers
    •  Permalloy Chambers
•  Vacuum Components
  •  >Linear Motion
    •  LM034
    •  LM070
    •  LM034-m/LM070-m
  •  >Magnetic Coupling
    •  MC034
  •  >Rotary Motion
    •  RM034
  •  >Rotary Manipulator
    •  MR070
  •  >Manipulators
    •  TM series
    •  TMZ series
    •  UHV Manipulator
    •  High Precision Manipulator
•  Special projects
  •  >Examples
    •  Examples

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UHV XY Manipulator

Features | Specification

Specifications

Motion	Range	Resolution
X	±5mm	0.6µm/step
Y	±10mm	0.6µm/step
Z	±10mm	0.6µm/step
Tilt (θy)	±60°	0.01°/step
Rotation (θz)	±180°	0.01°/step